Harrick Plasma 
Harrick Plasma公司的等离子清洗器是一种小型化、非破坏性的超清洗设备。等离子清洗器采用气体作为清洗介质，有效地避免了因液体清洗介质对被清洗物带来的二次污染。等离子清洗器外接一台真空泵，工作时清洗腔中的等离子体轻柔冲刷被清洗物的表面，短时间的清洗就可以使有机污染物被彻底地清洗掉，同时污染物被真空泵抽走，其清洗程度达到分子级。等离子清洗器除了具有超清洗功能外，在特定条件下还可根据需要改变某些材料表面的性能，等离子体作用于材料表面，使表面分子的化学键发生重组，形成新的表面特性。对某些有特殊用途的材料，在超清洗过程中等离子清洗器的辉光放电不但加强了这些材料的粘附性、相容性和浸润性，并可消毒和杀菌。等离子清洗器广泛应用于光学、光电子学、电子学、材料科学、生命科学、高分子科学、生物医学、微观流体学等领域。
Harrick Plasma, formerly known as Harrick Scientific, is a leading supplier of plasma equipment to the research community. We have been providing quality, low-cost, tabletop plasma devices specifically designed for laboratory, R&D and office use for over 30 years.

Harrick Plasma, formerly known as Harrick Scientific, has historically specialized in the design and manufacture of instruments for optical spectroscopy. Since its beginnings in 1969, Harrick Scientific has enjoyed a long reputation of advancing the frontiers of optical spectroscopy through its innovations to transmission, internal reflection, external reflection, diffuse reflection, and emission spectroscopy. The president and founder of the corporation, Dr. N. J. Harrick, pioneered internal reflection spectroscopy and became the principal developer of this technique.

Harrick Scientific was one of the first companies to pioneer the manufacture of benchtop research plasma devices more than thirty years ago. Although originally conceived for surface cleaning in optical spectroscopy and general optics, Harrick Scientific's plasma devices have found service in a wide variety of applications and in numerous technical fields. Our plasma devices are common in many research labs, and have been referenced in over 300 peer-reviewed papers and in more than 60 patents.

Harrick Plasma is located in Ithaca, New York. In our renewed focus, we look forward to continuing in our innovation of the use of plasma technology to meet the diverse surface treatment needs of the research community.