英***Nanobean NB5 电子束光刻机
具有良好的稳定性，平均正常运行时间超过93%
规格:
束流电压范围为: 20kV - 100kV
光刻胶的特征尺寸: <8nm (光刻精度)
500um区域拼接/叠加误差: 小于25nm
自动装载5卡盘气锁系统
NB5发展目标:
改进设计和组件以减少日常服务需求。
实现每年少于5%的机器故障停机时间。
提高性能
便于批量生产。
NB5系统将为进***步发展高偏转速度和进***步集成电子提供平台。
The nB4 is a generation ahead of the current competition ａnd with its field-proven performance has gained acceptance in the market place. It has excellent stability ａnd has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times ａnd service costs.
NB5 development aims:
Refine design ａnd components to reduce routine service requirements.
Achieve a machine-fault-downtime of less than 5% annually.
Enhance performance
Facilitate volume production.
Specification:
Beam Voltage range 20kV - 100kV
Feature size on resist <8nm
Stitching/overlay error <25nm for 500um field
Automatic loading 5 chuck airlock system
The nB5 system will provide a platform for further development to high deflection speed ａnd further integrated electronics.
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