美*** OAI 光刻机 Model 200 型桌面掩模对准器系统
完全手工操作
。输出光谱范围:Hg: G(436海里),H(405海里),I(365nm)和310nm线，Hg-Xe: 260nm和220nm或LED: 365nm, 395nm, 405nm
。衬底从块大小8平方
。互换抛掷和面具
。紫外灯功率范围从200到2000 w
。选择紫外LED光源(365 nm和405 nm)
。空气轴承真空吸盘
。接近(15-20um): & lt; 3.0 - 5.0, 软接触:2.0um，硬触点:1um和真空接点:≤0.5um
。对齐模块X, Y,和Z轴和θ
。双通道光学反馈
。只提供正面接触w / IR选项
。可用在桌面选项只适用于研发及独立工作
。.占用空间小
。适用于生物学、微机电系统、半导体和 Microfludics CLiPP应用程序
Model 200 Table Top Mask Aligner System
Complete Manual Operation
。 Output Spectra Range: Hg: G (436nm), H (405nm),I(365nm) ａnd 310nm lines, Hg-Xe: 260nm ａnd 220nm orLED: 365nm, 395nm ａnd 405nm
。Substrate Sizes from Pieces to 8” sq
。 Interchangeable chucks ａnd mask holders
。 UV Lamp Power range from 200 to 2,000W
。Option for UV LED (365nm ａnd 405nm) Light Source
。 Air bearing vacuum chuck
。 Proximity (15-20um): <3.0 – 5.0um,
Soft Contact:<2.0um, Hard contact: 1um and
vacuum contact : ≤ 0.5um
。Alignment module X, Y, ａnd Z axis ａnd theta
。 Dual-channel optical feedback
。 Provides Front side exposure only w/ IR Option
。 Available in Table top option only ａnd applicable for R&D ａnd standalone work
。 Small Footprint
。 Applicable for Biology, MEMS, Semiconductor ａnd Microfludics, CLiPP application
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